发明名称 |
ELECTRON BEAM VAPOR DEPOSITION APPARATUS AND METHOD |
摘要 |
An electron beam vapor deposition apparatus includes a coating chamber having a first chamber section with a first coating zone for depositing a first coating and a second chamber section with a second coating zone for depositing a second coating. At least one electron beam source is associated with the first chamber section and the second chamber section. A first crucible is adjacent to the first coating zone for presenting a first source coating material, and a second crucible is adjacent to the second coating zone for presenting a second source coating material. A transport is operative to move a work piece between the first coating zone of the first chamber section and the second coating zone of the second chamber section.
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申请公布号 |
US2010068417(A1) |
申请公布日期 |
2010.03.18 |
申请号 |
US20080211404 |
申请日期 |
2008.09.16 |
申请人 |
NEAL JAMES W;MALONEY MICHAEL J;LITTON DAVID A;MASUCCI CHRISTOPHER |
发明人 |
NEAL JAMES W.;MALONEY MICHAEL J.;LITTON DAVID A.;MASUCCI CHRISTOPHER |
分类号 |
C23C14/30 |
主分类号 |
C23C14/30 |
代理机构 |
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代理人 |
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地址 |
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