发明名称 PLASMA DEPOSITION WITH NON-CONDUCTIVE LAYER
摘要 <p>A method of fabricating an organic device is provided. An electrically- insulating layer (312) is grown over a first surface of a flexible conductive substrate (311). The flexible conductive substrate (311) is then placed on an electrode (313) of a deposition chamber (400), such that the electrically insulating layer (312) is in contact with the electrode (313) and prevents electrical contact between the electrode (313) and the flexible conductive substrate (311). A layer is deposited by a plasma process over the substrate (311) while the electrically insulating layer (312) is in contact with the electrode (313) of the deposition chamber (400).</p>
申请公布号 WO2010030866(A1) 申请公布日期 2010.03.18
申请号 WO2009US56643 申请日期 2009.09.11
申请人 UNIVERSAL DISPLAY CORPORATION;YAMAMOTO, HITOSHI;SILVERNAIL, JEFFREY 发明人 YAMAMOTO, HITOSHI;SILVERNAIL, JEFFREY
分类号 H01L51/56;C23C14/22 主分类号 H01L51/56
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