| 摘要 |
A coupling arrangement for coupling a light source subsystem with a scanner subsystem in a UV lithography system is disclosed. The arrangement includes a source flange having a plurality of ramped eared flanges coupled to one of the light source subsystem and the scanner subsystem. The arrangement also includes a collar coupled with the other of the light source subsystem and the scanner subsystem. The collar has a plurality of tangs disposed such that inter-tang spacings accommodate insertion of the plurality of eared flanges, wherein at least one of the source flange and the collar is rotatable to permit the plurality of ramped eared flanges to cam against the plurality of tangs, thereby coupling the light source subsystems to the scanner subsystem.
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