| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a placing table structure where, when a thin film is formed using raw material gas which generates thermal decomposition reaction having reversibility, decomposition suppressing gas is supplied toward a peripheral section of the subject to be processed so as to suppress the thermal decomposition of raw material gas caused by thermal decomposition reaction having reversibility, thus the deposition of the thin film to the bevel part and back face of the subject to be processed can be prevented while highly maintaining the uniformity in the plane of film thickness. <P>SOLUTION: In the placing table structure 29 which is disposed in a processing container 4 and has a subject W to be processed thereon so as to form a thin film on the subject in the processing container 4 by using raw material gas which generates thermal decomposition reaction having reversibility, the placing table structure is provided with a placing table 32 for the purpose of placing the subject to be processed on a placing surface 43, i.e., an upper surface of the placing table structure, and a decomposition suppressing gas supply means 70 which is arranged in the placing table for the purpose of supplying decomposition suppressing gas, which suppresses thermal decomposition of the raw material gas caused by thermal decomposition reaction having reversibility, toward a peripheral section of the subject placed on the placing surface of the placing table. In this way, decomposition suppressing gas is supplied toward a peripheral of the subject to suppress thermal decomposition of the raw material gas caused by thermal decomposition reaction having reversibility. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
