摘要 |
<p>The invention relates to a device (2) for generating an ion beam (4), comprising a support (6), an ion source (18), this ion source having a lower end (8) connected to the support (6) and an upper end (10) opposite the lower end (8), and an extraction means (12), for extracting the ions emitted by the source, this extraction means (12) comprising a wall (14) having an opening (16), the opening (16) being placed close to the upper end (10) of the ion source (18), so as to allow the extracted ions to pass through this opening. The device (2) further includes a means (M1, M2) for the generation of a magnetic field (B) capable of generating a magnetic field in the opening (16) of the extraction means, the generated magnetic field (B) being capable of deflecting charged particles (20) attracted by the ion source so that these charged particles do not reach the ion source.</p> |