发明名称 |
CHEMICAL VAPOR DEPOSITION REACTOR HAVING MULTIPLE INLETS |
摘要 |
A chemical vapor deposition reactor has a wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber and a plurality of injectors configured in flow controllable zones so as to mitigate depletion.
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申请公布号 |
US2010068381(A1) |
申请公布日期 |
2010.03.18 |
申请号 |
US20090623639 |
申请日期 |
2009.11.23 |
申请人 |
LIU HENG |
发明人 |
LIU HENG |
分类号 |
C23C16/458;C23C16/00;C23C16/44;C23C16/455;C30B25/14;C30B29/40 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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