发明名称 Semiconductor Device Having a Field Effect Source/Drain Region
摘要 A semiconductor device includes an active region defined in a semiconductor substrate, and gate electrodes crossing over the active region. Source/drain regions are defined in the active region on two sides of the gate electrode. At least one of the source/drain regions is a field effect source/drain region generated by a fringe field of the gate. The other source/drain region is a PN-junction source/drain region having different impurity fields and different conductivity than the substrate. At least one of the source/drain regions is a field effect source/drain region. Accordingly, a short channel effect is reduced or eliminated in the device.
申请公布号 US2010065894(A1) 申请公布日期 2010.03.18
申请号 US20090622863 申请日期 2009.11.20
申请人 PARK KI-TAE;CHOI JUNG-DAL;ROH UK-JIN 发明人 PARK KI-TAE;CHOI JUNG-DAL;ROH UK-JIN
分类号 H01L27/105;H01L29/772;H01L29/792 主分类号 H01L27/105
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