发明名称 |
Semiconductor device having symbol pattern utilized as identification sign |
摘要 |
A plurality of device patterns constituting part of an electronic circuit are formed over the surface of a substrate. A symbol pattern to be used for an identification sign is formed in the same layer as the device patterns. A width of the device pattern is within a pattern width range on a design rule. The symbol pattern is formed by a plurality of isolated element patterns. The element pattern is either a linear pattern or a dot pattern. A width of the element pattern is equal to or larger than 0.8 time a lower limit value of the pattern width range and equal to or smaller than 1.2 times an upper limit value of the pattern width range.
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申请公布号 |
US7679202(B2) |
申请公布日期 |
2010.03.16 |
申请号 |
US20070790123 |
申请日期 |
2007.04.24 |
申请人 |
FUJITSU MICROELECTRONICS LIMITED |
发明人 |
YOSHIDA SHIGEKI;USHIDA FUMIO;NAORI NOBUHISA;OZAKI YASUTAKA |
分类号 |
H01L23/544;H01L21/304;H01L21/76 |
主分类号 |
H01L23/544 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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