发明名称 |
A SUBSTRATE, AN INSPECTION APPARATUS, AND A LITHOGRAPHIC APPARATUS. |
摘要 |
<p>A target for measuring an overlay error or a critical dimension of a substrate comprises a grating. In one example, lines of the grating are arranged at an angle of about 45° with respect to edges of the target. As a consequence, the diffraction order of the grating reflection has its sub-maxima not aligned along the line on which the other diffraction orders are positioned, and overlap of intensity with other diffraction orders is reduced.</p> |
申请公布号 |
NL2003388(A) |
申请公布日期 |
2010.03.15 |
申请号 |
NL20092003388 |
申请日期 |
2009.08.25 |
申请人 |
ASML NETHERLANDS B.V., |
发明人 |
SMILDE, HENDRIK;COENE, WILLEM |
分类号 |
G01N21/47;G03F7/20 |
主分类号 |
G01N21/47 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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