Texturization mold forming method for fabricating photovoltaic solar cell, involves eliminating etching mask, forming texturization mold by electrolytic deposition of metal layer on support, and disintegrating support and texturization mold

摘要

The method involves forming an etching mask e.g. anisotropic etching mask, having predefined patterns, on a single-crystal silicon support (2) by using potassium hydroxide solution, and etching the support through the etching mask to form a textured zone having patterns. The etching mask is eliminated, and a texturization mold is formed by an electrolytic deposition of a metal layer (4) on the support. The support and the texturization mold are disintegrated, where the mold is made of nickel. A layer made of resistant material i.e. chromium, is deposited on a main face of the mold.