发明名称 SEMICONDUCTOR DEVICE INSPECTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device inspecting method more accurately determining the quality of an IC chip. SOLUTION: The method includes a wiring inspecting step of detecting a disconnection failure of wiring in the IC chip. The wiring inspecting step includes steps (steps (S) 3 to 7) of starting a functional test on a circuit including an inspected part to set the inspected part in a charge supplied state, irradiating the charge-supplied inspected part with light and outputting a result of the functional test after the inspected part is irradiated with the light for a predetermined time. According to this method, a malfunction caused by disconnection is made more liable to occur than would be possible in case of no irradiation of the inspected part with light and the sensitivity to detection of a disconnection failure can be increased. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010056278(A) 申请公布日期 2010.03.11
申请号 JP20080219412 申请日期 2008.08.28
申请人 SEIKO EPSON CORP 发明人 MIZOGUCHI TOSHIYUKI
分类号 H01L21/66 主分类号 H01L21/66
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