SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method that process a substrate with a processing liquid reduced in oxygen concentration. SOLUTION: The substrate processing apparatus 1 includes a spin chuck 3 for holding the substrate W, a blocking plate 6 which has a substrate opposite surface 34 opposed to the substrate W held by the spin chuck 3 and also has a peripheral wall portion 32 formed protruding from the periphery of the substrate opposite surface 34 toward the spin chuck 3, and a first upper processing liquid supply pipe 35 for supplying the processing liquid to the substrate W held by the spin chuck 3. Chemicals are supplied to the first upper processing liquid supply pipe 35 from a first in-piping-blending unit 51 through a second upper processing liquid supply pipe 38. The chemicals are blended by mixing, in a first mixing unit 59, the undiluted solution of chemicals with inert-gas dissolved water produced by removing oxygen in pure water and adding an inert gas into the pure water by an inert-gas dissolved water producing unit 50. COPYRIGHT: (C)2010,JPO&INPIT