发明名称 |
Positive resist composition, method of forming resist pattern, and polymeric compound |
摘要 |
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
|
申请公布号 |
US2010062369(A1) |
申请公布日期 |
2010.03.11 |
申请号 |
US20090461687 |
申请日期 |
2009.08.20 |
申请人 |
DAZAI TAKAHIRO;HIRANO TOMOYUKI;SHIONO DAIJU;MATSUMIYA TASUKU |
发明人 |
DAZAI TAKAHIRO;HIRANO TOMOYUKI;SHIONO DAIJU;MATSUMIYA TASUKU |
分类号 |
G03C1/00;C08F228/00;G03F7/00 |
主分类号 |
G03C1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|