发明名称 HOLOGRAM PATTERN FORMING METHOD, METHOD FOR MANUFACTURING FILM HAVING HOLOGRAM PATTERN, LAMINATE FILM AND CONTAINER
摘要 <p>Provided is a hologram pattern forming method by which manufacturing cost for forming a hologram pattern is reduced, while suppressing cost required for a mother die. A method for manufacturing a film having the hologram pattern is also provided. The hologram pattern forming method is provided with a coating step of coating a base material with a self-curable material; an overlapping step of overlapping the uncured self-curable material, which is applied on the base material in the coating step, on an uneven hologram pattern formed on the resin mother die; and a peeling step of peeling the self-curable material to which the hologram pattern is transferred in the overlapping step and the resin mother die one from the other.</p>
申请公布号 KR20100028049(A) 申请公布日期 2010.03.11
申请号 KR20097026824 申请日期 2008.07.01
申请人 TOYO SEIKAN KAISHA, LTD. 发明人 AKIMOTO MUNEKAZU;HIRATA KATSUYUKI
分类号 G03H1/04;G02B5/32 主分类号 G03H1/04
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