| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of irradiating plasma having various kinds of paths while reducing manufacturing cost. <P>SOLUTION: The plasma treatment device comprises an emitter 14 emitting plasma by inputting a high-frequency signal S, a torch type case 11 wherein the emitter 14 is arranged in an internal space, a gas supply section 3 for supplying gas G for plasma discharge into the case 11, and insulating pipes 30a-30c (tubular insulator) inserted by the emitter 14 and detachably installed on an inner surface of the case 11. The plasma generated in the vicinity of the emitter 14 by emitting the high-frequency signal S from the emitter 14 while supplying the gas G for plasma discharge can be irradiated to a treatment target object Z by jetting out the plasma from a spout 31a (one end) of the insulating pipes 30a-30c. <P>COPYRIGHT: (C)2010,JPO&INPIT |
