| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspection device capable of suitably and rapidly detecting a defect even when the manufacturing process is varied or the periodicity of images of an area to be inspected on a sample is low. SOLUTION: The defect inspection device includes: an imaging means 13 for taking an image 31 of an area to be inspected on a sample 11; a defect candidate detection means 14 for detecting defect candidates 41a-50a from the image 31; a storage means 15 for storing pattern information 33 with no defect in the area to be inspected; a pseudo-defect candidate detecting means 16 for detecting pseudo-detection candidates 41b-49b from the pattern information 33 with no defect; and a defect candidate limitation means 17 for associating the positions of the defect candidates 41a-50a with the pseudo-detection candidates 41b-49b, and registering the defect candidate 50a which is not associated with, as a defect 37. COPYRIGHT: (C)2010,JPO&INPIT
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