| 摘要 |
Organic Si/N compounds contng. at least one Si-N bond are prepd. by contacting an org. halo-silicon cpd. (I) in which at least one halogen atom is directly linked to an Si atom, with a nitrogen base (II), in which at least one H atom is directly linked to an N atom, at a temp. above 50 deg.C., in the presence of Mg, Ca or Zn, at a contact rate which is not greater than the reaction rate of the metal with the formed hydrogen halide, and nitrogen base/hydrogen halide salt. The molar amount of metal is 80-130% of the amount which is stoichiometrically equivalent with the reacting silicon-halogen bonds, and the amount of nitrogen base is at least stoichiometrically equivalent with the reacting silicon-halogen bonds. |
