| 发明名称 |
Treatment solution and method of applying a passivating layer |
| 摘要 |
A treatment solution for a semiconductor wafer comprising water, a passivating reagent and a surfactant. The treatment solution is either mixed with a cleaning fluid, a rinsing fluid or a drying vapor, and is used in a cleaning apparatus employing a Marangoni dryer.
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| 申请公布号 |
US7674725(B2) |
申请公布日期 |
2010.03.09 |
| 申请号 |
US20050914878 |
申请日期 |
2005.05.25 |
| 申请人 |
FREESCALE SEMICONDUCTOR, INC. |
发明人 |
FARKAS JANOS;PETITDIDIER SEBASTIEN |
| 分类号 |
H01L21/31 |
主分类号 |
H01L21/31 |
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