发明名称 Imprint lithography
摘要 An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.
申请公布号 US7676088(B2) 申请公布日期 2010.03.09
申请号 US20040019521 申请日期 2004.12.23
申请人 ASML NETHERLANDS B.V. 发明人 SIMON KLAUS
分类号 G06K9/00;B41F33/00;G03B27/58 主分类号 G06K9/00
代理机构 代理人
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