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发明名称
METHOD FOR MANUFACTURING SIDEWALL SPACER OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100945867(B1)
申请公布日期
2010.03.08
申请号
KR20070124330
申请日期
2007.12.03
申请人
发明人
分类号
H01L21/3205
主分类号
H01L21/3205
代理机构
代理人
主权项
地址
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