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发明名称
PRECURSORS FOR ATOMIC LAYER DEPOSITION
摘要
Stable ALD precursors that have at least one metal-nitrogen bond and a mixed ligand are presented. These ALD precursors exhibit self-limiting growth, at reduced deposition temperature and produce less contamination all with enhanced stability.
申请公布号
US2010055321(A1)
申请公布日期
2010.03.04
申请号
US20070374414
申请日期
2007.07.12
申请人
MA CE;WANG QING MIN
发明人
MA CE;WANG QING MIN
分类号
C23C16/448;C09D1/00
主分类号
C23C16/448
代理机构
代理人
主权项
地址
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