| 摘要 |
PURPOSE: A positive resist composition, a method of making resist pattern, and a new high molecular compound used in the positive resist composition are provided to improve a state changing property and to prevent a perfect circle of a hole from degrading. CONSTITUTION: A positive resist composition consists of a substrate component in which the solubility of an alkaline developing solution is enlarged with a reaction to acid, and a photoacid generator component which generates acid with an exposure. The substrate component contains a high molecular compound with a component induced from esther acrylate including an acid beaver dissolution inhibitor or a component shown in chemical formula 1. In chemical formula 1, R1 refers to a hydrogen atom, a low alkyl group, or a halogenation low alkyl group. R2 refers to a divalent coupling element. R3 refers to a ring shaped group, including -SO_2- in a ring structure.
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