METHOD FOR ADJUSTING ELECTRON BEAM PLOTTING DEVICE AND METHOD FOR ADJUSTING CONTROL DEVICE FOR CONTROLLING ELECTRON BEAM PLOTTING DEVICE
摘要
<p>An electron beam plotting device to be adjusted is caused to plot a predetermined test pattern. According to an image expressing the plotted test pattern, correction data for correcting a control amount of a plotting control unit is generated in the electron beam plotting device. According to the correction data, the control amount of the plotting control unit is corrected in the electron beam plotting device.</p>
