| 摘要 |
A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whetherδ1<ε-1, whereinδ1 represents model vs. exposure difference andε-1 represents predetermined criteria. The technique further includes completing the model whenδ1<ε-1.
|
