发明名称 STRUCTURE FABRICATION METHOD, STRUCTURE FABRICATION DEVICE, AND STRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and a device capable of removing unnecessary particles deposited on a structure or a substrate and not contributed for forming the structure, thereby fabricating a uniform, stable and excellent structure in the structure fabrication method by which the film-like structure composed of a particle material by blowing aerosol formed by mixing particles with gas to a substrate at high speed, and to provide the structure formed by the method. Ž<P>SOLUTION: In the structure fabrication method for fabricating a film-like structure 10 composed of a particle material by blowing aerosol 4 formed by mixing particles 3 with gas 1 to a substrate 9 at high speed, the structure 10 or the substrate 9 is brought into contact with a particle-removing liquid 15 after fabricating the structure 10, and unnecessary particles 11 which are deposited on the structure 10 or the substrate 9 and not contributed for forming the structure 10 are removed. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010047781(A) 申请公布日期 2010.03.04
申请号 JP20080210426 申请日期 2008.08.19
申请人 PANASONIC CORP 发明人 HAMANO TAKASHI;GYOTOKU AKIRA
分类号 C23C24/04 主分类号 C23C24/04
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