| 摘要 |
PROBLEM TO BE SOLVED: To provide a film thickness measuring method capable of improving the reliability of measuring. SOLUTION: The film thickness measuring method includes: irradiating a light to a substrate to be measured; spectroscopically separate the reflected light from the substrate to be measured; detecting the spectroscopically separated light and outputting a signal according to the intensity of the detected light; calculating the thickness of a thin film based on the error between the output signal and the theoretical waveform; grouping the measurement points; among the measured data at a plurality of the measurement points grouped as the same group, determining a part of them as a measurement error according to at least one side of the thickness of the thin film and the error; and conducting the statistical processing by removing the measurement data determined to be the measurement error from the statistical data for the statistical processing. COPYRIGHT: (C)2010,JPO&INPIT |
