| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W). The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.</p> |
| 申请公布号 |
KR20100023036(A) |
申请公布日期 |
2010.03.03 |
| 申请号 |
KR20107001243 |
申请日期 |
2006.11.16 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
OTTENS JOOST JEROEN;TEN KATE NICOLAAS;KEMPER NICOLAAS RUDOLF;LEENDERS MARTINUS HENDRIKUS ANTONIUS;SMEULERS JOHANNES PETRUS MARIA;BECKERS MARCEL;SHULEPOV SERGEL;RIEPEN MICHEL |
| 分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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