| 摘要 |
A pattern projector including a source of light to be projected, a spatial light modulator arranged in a spatial light modulator plane, the spatial light modulator receiving the light from the source of light and being configured to pass the light therethrough in a first pattern and projection optics receiving the light from the spatial light modulator and being operative to project a desired second pattern onto a projection surface lying in a projection surface plane which is angled with respect to the spatial light modulator plane, the first pattern being a distortion of the desired second pattern configured such that keystone distortions resulting from the difference in angular orientations of the spatial light modulator plane and the projection surface plane are compensated.
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