发明名称 OXIDE SEMICONDUCTOR AND THIN FILM TRANSISTOR COMPRISING THE SAME
摘要 PURPOSE: An oxide semiconductor and a thin film transistor comprising the same are provided to use an oxide semiconductor in a channel region by adding a new material to a Zn oxide. CONSTITUTION: An oxide semiconductor adds a lanthanum series substance to a Zn oxide series compound. The lanthanum series substance is selected from a group comprised of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and a compound. The compound contains at least two kind of elements. Zn oxide series compound is one of a Zn oxide, an In-Zn oxide or a Ga-In-Zn oxides. The oxide semiconductor is an amorphous oxide semiconductor.
申请公布号 KR20100022408(A) 申请公布日期 2010.03.02
申请号 KR20080081073 申请日期 2008.08.19
申请人 SAMSUNG ELECTRONICS CO., LTD.;SAMSUNG SDI CO., LTD. 发明人 KIM, CHANG JUNG;KIM, SANG WOOK;PARK, JIN SEONG
分类号 H01L21/20 主分类号 H01L21/20
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