发明名称 Apparatus for forming fine pattern on substrate
摘要 An apparatus of forming a fine pattern includes a chamber having a predetermined process space, a stage for supporting a substrate on which a photosensitive organic layer is formed, using buoyancy, a template disposed away from the stage to imprint a preprocess pattern dividing etching and non-etching regions on the organic layer of the substrate, and a driving unit for moving the stage toward the template so that the pattern formed on the template can be formed on the organic layer of the substrate.
申请公布号 US7670128(B2) 申请公布日期 2010.03.02
申请号 US20050319637 申请日期 2005.12.28
申请人 DMS CO., LTD. 发明人 LEE YOUNG-CHUL;PARK YONG-SEOK;HEO KYOUNG-HEON;JU YEON
分类号 B29C59/00;B81C99/00 主分类号 B29C59/00
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