The present invention generally relates to a gas distribution showerhead and a shadow frame for an apparatus. By extending the corners of the gas distribution showerhead the electrode area may be expanded relative to the anode and thus, uniform film properties may be obtained. Additionally, the expanded corners of the gas distribution showerhead may have gas passages extending therethrough. In one embodiment, hollow cathode cavities may be present on the bottom surface of the showerhead without permitting gas to pass therethrough. The shadow frame in the apparatus may also have its corner areas extended out to enlarge the anode in the corner areas of the substrate being processed and thus, may lead to deposition of a material on the substrate having substantially uniform properties.
申请公布号
WO2010021938(A2)
申请公布日期
2010.02.25
申请号
WO2009US53922
申请日期
2009.08.14
申请人
APPLIED MATERIALS, INC.;CHO, TOM, K.;YUAN, ZHENG;SHIEH, BRIAN, SY-YUAN