| 摘要 |
An exhaust-gas treatment system for treating exhaust gas from a semiconductor manufacturing line, an ICD manufacturing line, etc., is disclosed. The exhaust gas, which is sucked and guided by a blower fan 16, is first introduced and passed through a deodorizing layered active carbon filter 12 acting as a pre-filter. Consequently, the entrained odoriferous substances in a gaseous phase or a vapor phase, or both, are removed. The resulting exhaust gas is then passed thorough a bag-filter element 14 to remove its dust, etc. The bag-filter element 14 cannot be clogged at an early stage, since the odoriferous substances, which are in a gaseous phase or a vapor phase, or both, have had their high adhesive properties removed by the pre-filter 12.
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