| 摘要 |
<p>PURPOSE: A regular lithography method is provided to supply a pitch set condition for forming a uniform projection structure on equal sides by analyzing the projecting structure which change according to the pitch. CONSTITUTION: In a regular lithography method, a projection angel is determined less than 3 pie/4 radian(S110). B of vertical cell number and A of transverse cell number are relatively prime and they are over 1. A time resolution S, a reflection length ratio Z, an image interval C, the transverse cell number A, and the vertical cell number B are decided so that the scan resolution D and unit step number L are integral number. A mirror angle is formed based on the reflection length ratio Z, the transverse cell number A and vertical cell number B(S450).</p> |
