PATTERNING METHOD, ORGANIC ELECTRIC ELEMENT, ORGANIC ELECTROLUMINESCENCE ELEMENT, AND ORGANIC SEMICONDUCTOR TRANSISTOR

摘要

PROBLEM TO BE SOLVED: To provide a patterning method for suppressing residues at a pattern formation process from remaining in a formed recessed part or a hole in the formation of a pattern on a pattern formed layer. SOLUTION: The organic semiconductor transistor element 40 includes an insulating layer 47 formed by uniformly coating an insulating material for forming a barrier wall 49 on a substrate 42 with a source electrode 44 and a drain electrode 45 formed thereon as shown in Fig.8 in a manufacturing process. A mold 60 which has a projection 60A corresponding to a pattern to be formed and is coated with a solution 62 for dissolving the insulating layer on the projection part 60A is brought into contact with the insulating layer 47. Thereby, the insulating layer 47 is dissolved and the hole part 49A corresponding to the projection part 60A is formed, and then the mold 60 is separated from the substrate 42 to pattern the hole 49A. COPYRIGHT: (C)2010,JPO&INPIT