| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treatment agent for a freezing process that meets the requirement that (1) the line width of a first resist pattern does not fluctuate and (2) the line edge roughness (LER) of the first resist pattern does not deteriorate, by a freezing process in a freezing process that is applied to the first resist pattern in a double patterning method, and a pattern forming method using it. <P>SOLUTION: The surface treatment agent for resist pattern formation contains a compound having an oxazoline group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
