| 摘要 |
<P>PROBLEM TO BE SOLVED: To continuously supply a processing liquid, to subject the processing liquid to vapor liquid separation, and to improve the cleanliness of the processing liquid. Ž<P>SOLUTION: A reservoir mechanism 60 for reservoiring the processing liquid includes: a reservoir container 61 which performs the vapor liquid separation through pressurizing operation by rotation of an impeller 64a of a pressurizing mechanism 64 and then discharges a separated gas from a discharge flow passage 67a; a pressurization conduit 69 which connects a lower discharge port side to an upper portion of the reservoir container and in which an opening/closing valve V2 and a filter F are interposed; a pressurization conduit 69 which connects the pressurization conduit to the discharge flow passage and in which an opening/closing valve V3 for pressurization is interposed; and a controller 200 which controls a main opening/closing valve V1 on the side of a processing liquid supply source 70, the opening/closing valve, the opening/closing valve for pressurization, and the impeller based upon a detection signal of a pressure detecting means 74 for detecting the pressure on a discharge port side. The processing liquid is discharged over the vapor liquid separation during processing, but circulated not during the processing to maintain the flow velocity and pressure in the reservoir container. During a gas discharging operation, the pressure in pressurization conduit is applied to the discharge flow passage to discharge the separated gas. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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