发明名称 MIRROR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10 - 200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.</p>
申请公布号 WO2010018046(A1) 申请公布日期 2010.02.18
申请号 WO2009EP59178 申请日期 2009.07.16
申请人 ASML NETHERLANDS B.V.;BANINE, VADIM;SJMAENOK, LEONID 发明人 BANINE, VADIM;SJMAENOK, LEONID
分类号 G03F7/20;G21K1/06 主分类号 G03F7/20
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