METHOD FOR FABRICATION OF SELF ALIGN CONTACT HOLE OF SEMICONDUCTOR DEVICE USING ArF PHOTO LITHOGRAPHY,申请号KR20020084429-传众专利搜索

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发明名称	METHOD FOR FABRICATION OF SELF ALIGN CONTACT HOLE OF SEMICONDUCTOR DEVICE USING ArF PHOTO LITHOGRAPHY
摘要
申请公布号	KR100942980(B1)	申请公布日期	2010.02.17
申请号	KR20020084429	申请日期	2002.12.26
申请人		发明人
分类号	H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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