发明名称 High-transmittance attenuated phase-shift mask blank
摘要 The present invention discloses a HT-AttPSM (high-transmittance attenuated phase-shift mask) blank with phase-shifters composed of the (Al2O3)x/(TiO2)1-x superlattice film stacks, wherein x preferably ranges 79~84%. Particularly, the four-stacked superlattice films of the present invention perform superior optical properties including transmittance of 19.9% and a reflectance of 3.2% at the wavelength of 193 nm and an inspection transmittance less than 20% at the wavelength of 257 nm.
申请公布号 US7662520(B2) 申请公布日期 2010.02.16
申请号 US20050244227 申请日期 2005.10.06
申请人 NATIONAL KAOHSIUNG FIRST UNIVERSITY OF SCIENCE AND TECHNOLOGY 发明人 LAI FU-DER
分类号 G03F1/00 主分类号 G03F1/00
代理机构 代理人
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