发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device capable of stabilizing film quality of a gate insulating film containing at least either of Hf and Zr; and to provide a method of manufacturing the same. SOLUTION: The semiconductor device includes: a semiconductor layer; the gate insulating film formed on the semiconductor layer and containing at least either of Hf and Zr; and a gate electrode formed on the gate insulating film and containing carbonitride containing at least either of Hf and Zr. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2010034440(A) |
申请公布日期 |
2010.02.12 |
申请号 |
JP20080197370 |
申请日期 |
2008.07.31 |
申请人 |
TOSHIBA CORP |
发明人 |
KANEKO AKIO;INUMIYA SEIJI |
分类号 |
H01L29/78;H01L29/423;H01L29/49 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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