发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device capable of stabilizing film quality of a gate insulating film containing at least either of Hf and Zr; and to provide a method of manufacturing the same. SOLUTION: The semiconductor device includes: a semiconductor layer; the gate insulating film formed on the semiconductor layer and containing at least either of Hf and Zr; and a gate electrode formed on the gate insulating film and containing carbonitride containing at least either of Hf and Zr. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010034440(A) 申请公布日期 2010.02.12
申请号 JP20080197370 申请日期 2008.07.31
申请人 TOSHIBA CORP 发明人 KANEKO AKIO;INUMIYA SEIJI
分类号 H01L29/78;H01L29/423;H01L29/49 主分类号 H01L29/78
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