发明名称 |
END EFFECTOR TO SUBSTRATE OFFSET DETECTION AND CORRECTION |
摘要 |
A port door providing an interface into a processing tool is provided. The port door includes first and second arms pivotably mounted on a top edge of the port door. The first and second arms are configured to extend from a plane of the port door towards a carrier containing substrates for the processing tool. The first arm has an emitter transmitting a beam that is split into a plurality of sub-beams within the first arm. The second arm has a plurality of sensors receiving corresponding sub-beams, wherein one of sub-beams provides information as to a position of an end effector relative to a gap between the substrates in the carrier.
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申请公布号 |
US2010034621(A1) |
申请公布日期 |
2010.02.11 |
申请号 |
US20090432359 |
申请日期 |
2009.04.29 |
申请人 |
MARTIN RAYMOND S;BONORA ANTHONY C;KROLAK MICHAEL |
发明人 |
MARTIN RAYMOND S.;BONORA ANTHONY C.;KROLAK MICHAEL |
分类号 |
H01L21/677 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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