| 摘要 |
The invention relates to a method for transferring surface structures such as interference layers, holograms, and other highly refractive optical microstructures to substrates. The aim of the invention is to devise a method which is used for transferring surface structures such as interference layers, holograms, and other highly refractive optical microstructures to substrates and can also be used in a high temperature range. The aim is achieved by a method comprising the following steps: a) a flexible intermediate support layer is applied to a support film as a release layer; b) an embossed sol is applied to the intermediate support layer and is provided with a surface structure; c) a stack encompassing a binder layer and the surface structure is produced; d) the support film is removed; e) the workpiece is thermally treated.
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