| 摘要 |
<p>Disclosed is a vacuum treatment apparatus with a degassing chamber that does not require a large evacuation device. When a treated object is heated and degassed inside the degassing chamber and then transported through a buffer chamber into a treatment chamber where vacuum treatment is performed, an evacuation system with a low exhaust rate is connected to the degassing chamber, and degassing is performed in a 1 to 100 Pa vacuum atmosphere (time 0 to t2). Next the treated object is moved to a buffer chamber, and the pressure inside the buffer chamber is lowered to approximately the same pressure as the treatment chamber (time t2 to t3), the buffer chamber and treatment chamber are connected, and the treated object is transported into the treatment chamber. When the prior art, in which the degassing chamber is taken to a high-vacuum atmosphere by an evacuation device with a high exhaust rate (curve group B), and the present invention (curve group A) are compared, comparing shifts in pressure change, there is no difference in processing times.</p> |
