发明名称 FIELD EFFECT TRANSISTOR
摘要 <p>Disclosed is a field effect transistor equipped with a substrate; a drift layer formed on the substrate; an electron barrier layer formed in a higher layer than the drift layer; an electron transit layer formed on the electron barrier layer; a gate electrode formed on the electron transit layer; an electron conduction region that is on one side, in the gate length direction, of the gate electrode and that extends from the electron transit layer to a region that is more toward the substrate than the electrode barrier layer; a source electrode that is on the other side, in the gate length direction, of the gate electrode, and that is formed on the electron transit layer; and a drain electrode that is electrically connected to one end of the electron conduction layer on the substrate side through the drift layer.</p>
申请公布号 WO2010016213(A1) 申请公布日期 2010.02.11
申请号 WO2009JP03652 申请日期 2009.07.31
申请人 NEC CORPORATION;NAKAYAMA, TATSUO;ANDO, YUJI;MIYAMOTO, HIRONOBU;OKAMOTO, YASUHIRO;INOUE, TAKASHI 发明人 NAKAYAMA, TATSUO;ANDO, YUJI;MIYAMOTO, HIRONOBU;OKAMOTO, YASUHIRO;INOUE, TAKASHI
分类号 H01L29/78;H01L29/80;H01L21/338;H01L29/778;H01L29/812 主分类号 H01L29/78
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