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发明名称
METHOD OF FABRICATING A SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
KR100940748(B1)
申请公布日期
2010.02.11
申请号
KR20067010999
申请日期
2004.12.01
申请人
发明人
分类号
H01L21/20;H01L21/324;H01L21/762
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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