发明名称 Lithographic apparatus and device manufacturing method.
摘要 An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article.
申请公布号 NL2003258(A1) 申请公布日期 2010.02.09
申请号 NL20092003258 申请日期 2009.07.22
申请人 ASML NETHERLANDS B.V. 发明人 JOOST OTTENS;JOHANNES JACOBS
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址