METHOD AND DEVICE FOR CLEANING A SUBSTRATE, AND STORAGE MEDIUM

摘要

Disclosed is a cleaning method in which a substrate having a pattern formed on the surface thereof is cleaned using a cleaning fluid, wherein the substrate can be cleaned while preventing the pattern protrusions from being flattened when the cleaning fluid is removed or dried. The cleaning method includes the steps of: loading a substrate onto a loading platform inside a processing vessel; heating the substrate; and supplying a cleaning fluid onto the surface of the substrate. The Leidenfrost phenomenon occurs in the cleaning fluid supply step, and the substrate is heated in the substrate heating step in such a way that steam from the cleaning fluid comes between the substrate and droplets of the cleaning fluid supplied to the substrate.