发明名称 METHOD FOR PRODUCING NANOWIRE, NANOWIRE ELEMENT, AND NANOWIRE STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing nanowires, by which single crystal nanowires maintaining a crystal state of a crystal substrate and free of defects can be grown. SOLUTION: The formation of side facet necessary for free-standing nanowire is made unstable and the growth of a nanowire in a direction parallel to the surface of a crystal substrate and along the surface is made possible by growing the nanowire under growth conditions purposefully shifted from the relatively narrow range of growth conditions allowing the growth of the free-standing nanowire. Alternatively, it is possible to continuously arrange an n-type InP-nanowire 3n and a p-type InP nanowire 3p by switching, for example, the dopant on the way of growth of the nanowire, and further, a net-like semiconductor film can be obtained by crossing a plurality of parallel nanowires. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010024081(A) 申请公布日期 2010.02.04
申请号 JP20080186474 申请日期 2008.07.17
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 TATENO KOTA;SHO KOKUKYO
分类号 C30B29/62;C01B25/08;C30B29/40;H01L29/06 主分类号 C30B29/62
代理机构 代理人
主权项
地址