| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern drawing device and a position control method, with which misregistration of a pattern to be formed on the major surface of a substrate, caused by a measurement error of an environmental parameter is prevented while controlling relative positions of a stage and a light irradiating section on the basis of the measurement value by a laser interferometer and the environmental parameter, and decrease in a processing speed of the pattern drawing device is prevented. <P>SOLUTION: The pattern drawing device controls, in a drawing process, the position of a stage on the basis of a position parameter measured by first and second interferometers and on the basis of a given environmental parameter (in a fixed value mode). Thereby, misregistration of the pattern to be formed on the major surface of the substrate, caused by a measurement error of the environmental parameter is prevented. Since the system does not require an increase in the frequency of measuring the environmental parameter so as to prevent misregistration, decrease in the production speed by the pattern drawing device is avoided. <P>COPYRIGHT: (C)2010,JPO&INPIT |
