| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a waste gas detoxification apparatus capable of carrying out detoxification treatment of even a waste gas containing a large quantity of a combustible gas without a risk of backfire and increasing the washing efficiency of a waste gas as compared with a conventional inlet scrubber. <P>SOLUTION: The waste gas detoxification apparatus 10 is composed of a washing water tank 20 for storing washing water W for washing a combustible gas-containing waste gas F discharged out of a semiconductor fabrication apparatus, a waste gas washer 12 having a downstream end 22b opened in the washing water W stored in the washing water tank 20 and a waste gas introduction duct 22 for introducing the waste gas F into the washing water tank 20, and a thermal decomposition furnace 14 for receiving the waste gas F washed in the waste gas washer 12 and thermally decomposing a thermally decomposable gas in the waste gas F to solve described problems. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
